SINO-ALD C200/C300
Time：2020/09/07 10:34:44
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PRODUCT INTRODUCTION SINO-ALD C200/C300 is an integrated process platform independently developed by AMTE for large-scale production. Thermal type and plasma type process can be configured at the same system, it can be compatible with a variety of processes and detection equipment. Also, it’s equipped with high precision automatic vacuum robot. Suitable for mass production of semiconductor production lines such as integrated circuits, advanced packaging and power devices. Innovative interlock cluster design, easy interface operation. APPLICATIONS · 8-12 inch and under 8 inch semiconductor production line · Scientific research or industrial production of oxide and nitride thin film process ADVANTAGES · High precision flexible vacuum robot · Compatible with 200m / 300mm semiconductor production line · 4 stations, can be configured with the same or different equipment · Large scale production · Perfect interlock cluster TECHNICAL PARAMETERS Wafer size: 200mm /300mm Cassette: 25pcs Loading/unloading mode: automatically |
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