SINO-ALD P200
Time：2020/09/07 10:38:38
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PRODUCT INTRODUCTION SINO-ALD P200 is a mass production atomic layer deposition system independently developed by AMTE. It adopts our innovation of chamber and gas flow design to effectively reduce cost and increase production to ensure good film quality performance. It is the best choice for batch production of 8" and under 8" wafers. Humanized software design, easy to operate. APPLICATIONS · Organic / inorganic light emitting diodes · MEMS · Power devices · Integrated circuit ADVANTAGES · Low precursor source consumption and short film growth cycle · Compact integrated design, less space occupation · Stable temperature and high film uniformity · Suitable for high aspect ratio structure ·Optional preheating module can effectively reduce waiting time and improve production capacity · The product fully conforms to SEMI S2/S8 and SECS/GEM standards TECHNICAL PARAMETERS Max. wafer size: 8'' (200mm) Cassette: 25pcs Non-uniformity: 1% Max. Temp: 500℃ |
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