SINO-Plasma 1000 Glue remover
Time：2020/09/07 10:48:44
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PRODUCT INTRODUCTION SINO-plasma 1000 is a multiple -chamber plasma stripper equipment independently developed by AMTE. It adopts the design of open transmission platform, inductively coupled plasma (ICP) source and double wafer reaction chamber. It is equipped with high-precision transmission arm. The operation interface based on Windows platform is easy to operate and the system structure is reasonable. The equipment has the advantages of small space occupation, high productivity efficiency, low cost of consumables (COC) and operating cost (COO). It is the best choice for photoresist removal in the semiconductor front end process and back end process. APPLICATIONS · 6-8 inch silicon based semiconductor production line · Plasma stripper application of 4-6 inch SiC, GaN and GaAs production lines · Packaging and testing process, MEMS and other applications ADVANTAGES · Dual chambers and dual wafer processes, high productivity efficiency · High density plasma, high stripping rate · Faraday ion completely shielding, low plasma damage on wafer surface of the device. · Low consumption and maintenance cost of reaction chamber process kit · Be applied to various plasma stripper conditions TECHNICAL PARAMETERS Equipment Availability / Uptime: ≥92 WPH: >140 Strip Rate: >6,0000 A/min Strip Rate Uniformity: <5% Substrate Loss: <15A |
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