Process Case | AMTE Ion Implantation and Photolithography Adhesive Removal Process

Time：2025/06/23

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In the ion implantation process of semiconductor manufacturing, photoresist serves as a key mask to protect specific are...

AMTE News | New Breakthrough in Domestic Equipment! AMTE's first 12 inch CCP SPC 12D etching machine has been successfully delivered to BYD Semiconductor in Chengdu

Time：2025/06/20

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Recently, AMTE announced another good news - the first 12 inch dielectric layer etching machine SPC 12D independently de...

Process Case | AMTE ALD Bragg Atomic Stack (BAS) Technology

Time：2025/05/26

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DBR (Distributed Bragg Reflector) is an optical component based on the Bragg reflection principle, which achieves effici...

The 4th Science and Technology Forum of Zhihui Frontier · Jointly Expanding Xincheng and AMTE has successfully concluded

Time：2025/05/13

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At a critical period when the semiconductor industry is accelerating towards high-end and intelligent development, the 4...

Process Case | AMTE SINO Plasma 6000 ICP SiC trench etching bottom corner and sidewall roughness optimization development

Time：2025/04/17

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Silicon carbide (SiC), as a representative of third-generation semiconductor materials, has become the core material for...